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Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

PaperCitations, authors & open-access status

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is a paper indexed in PICO Portal from OpenAlex.

How many citations does Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) have?

PICO Portalcitation count

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) has 240 citations in the OpenAlex counts PICO Portal stores.

When was Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) published?

PICO Portalyear

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) has 2004 year in the PICO Portal index.

What is the open-access status of Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)?

PICO Portaloa status

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) has closed oa status in the PICO Portal index.

What is the DOI of Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)?

PICO Portaldoi

The DOI for Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is on the source record.

What is the OpenAlex record for Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)?

PICO Portalopenalex

The OpenAlex for Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate) is on the source record.

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