Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors is a paper indexed in PICO Portal from OpenAlex.

How many citations does Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors have?

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors has 78 citations in the OpenAlex counts PICO Portal stores.

When was Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors published?

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors has 2014 year in the PICO Portal index.

What is the open-access status of Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors?

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors has closed oa status in the PICO Portal index.

What is the DOI of Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors?

The DOI for Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors is on the source record.

What is the OpenAlex record for Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors?

The OpenAlex for Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors is on the source record.