Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices
Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices is a paper indexed in PICO Portal from OpenAlex.
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Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices has 79 citations in the OpenAlex counts PICO Portal stores.
When was Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices published?
Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices has 2007 year in the PICO Portal index.
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Study of electrical and microstructure properties of high dielectric hafnium oxide thin film for MOS devices has closed oa status in the PICO Portal index.
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