Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering
Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering is a paper indexed in PICO Portal from OpenAlex.
How many citations does Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering have?
Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering has 70 citations in the OpenAlex counts PICO Portal stores.
When was Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering published?
Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering has 2005 year in the PICO Portal index.
What is the open-access status of Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering?
Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering has closed oa status in the PICO Portal index.
What is the DOI of Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering?
The DOI for Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering is on the source record.
What is the OpenAlex record for Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering?
The OpenAlex for Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering is on the source record.