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Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing

PaperCitations, authors & open-access status

Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing is a paper indexed in PICO Portal from OpenAlex.

How many citations does Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing have?

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Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing has 93 citations in the OpenAlex counts PICO Portal stores.

When was Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing published?

PICO Portalyear

Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing has 2002 year in the PICO Portal index.

What is the open-access status of Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing?

PICO Portaloa status

Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing has closed oa status in the PICO Portal index.

What is the DOI of Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing?

PICO Portaldoi

The DOI for Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing is on the source record.

What is the OpenAlex record for Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing?

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The OpenAlex for Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO<sub>2</sub>Chemical Mechanical Polishing is on the source record.

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